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20 KL Cryogenic Liquid Medical Oxygen Vertical Storage Tank Kokrajhar medical College and hospital Kokrajhar Assam

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CRYO-20KL-V-Oxygen, Cryogenic vertical storage tank is used to store and use liquid Oxygen. Cryogenic tanks are used to store natural gases such as oxygen, argon, nitrogen, helium, hydrogen and other materials. Tanks can store the materials at the correct temperature and pressure for transportation.

  • Product Specifications:
  • Product: Cryogenic Vertical Storage Tank
  • Capacity: 20KL (Tolerance: +/- 1KL)
  • Quantity: 1No
  • Application: Storage & use of Liquid Oxygen for semiconductor processing.
  • Design and Manufacturing Code: EN13458-2:2002 / ASME Section VIII Division 1/EN13458-2+Annex “C”.

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    Technical Details

    • 20 KL capacity vacuum + Perlite or Vacuum +super insulated vertical storage tank designed to EN-13458 code (Empty LMO Tank)
    • GROSS VOLUME 19220 LIT approx NET CAPACITY 18441 LIT approx.
    • INNER VESSEL MATERIAL: STAINLESS STEEL DESIGN & MANUFACTURING CODE EN13458
    • MAX. ALLOWABLE WORKING PRESSURE 17 KG/CM2 (g)
    • DESIGN PRESSURE (Corrected for vacuum) 18.633 KG/CM2 (g) DESIGN
    • TEMPERATURE -196 TO +40 DEG. C
    • CLEANING DUTY OXYGEN
    • INSULATION VACUUM + PERLITE OR VACUUM + SUPERINSULATED OUTER VESSEL MATERIAL CARBON STEEL
    • Pressure switch (operating depth of 1m (0.1 bar) for battery activation
    • DESIGN CODE EN13458 RATING PRESSURE VACUUM
    • EMPTY WEIGHT [APPROX] 8340 Kg. DIMENSIONS OUTSIDE DIAMETER 2112mm OVERALL HEIGHT 10321mm
    • EXTERNAL SURFACE MECHANICAL CLEANING, PRIMER / FINAL PAINT(POLYURETHANE) TWO COATS EACH, Exact volume could be +/-3% after stretching

    CRYO-20KL-V-Oxygen, Cryogenic vertical storage tank is used to store and use liquid Oxygen. Cryogenic tanks are used to store natural gases such as oxygen, argon, nitrogen, helium, hydrogen and other materials.

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    Key Features

    • Cryogenic Vertical Storage Tank
    • Capacity: 20KL (Tolerance: +/- 1KL).
    • It is GPS enable.
    • Thermal Insulation: Perlite+ Vacuum
    • Application: Storage & use of Liquid Oxygen for semiconductor processing.
    • Design Temperature: Inner Vessel: -196 to + 40 Deg. C, outer vessel: -20 to + 55 Deg.
    • NER % / Day for Liquid Oxygen application: ≤0.45% / Day
    • Annulus Vacuum (Warm): ≤100Microns.

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